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A Study on the Thermal Reliability of Cu/SnAg Double-Bump Flip-Chip Assemblies on Organic Substrates

机译:有机衬底上Cu / SnAg双凸块倒装芯片组件的热可靠性研究

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The Cu/SnAg double-bump structure is a promising candidate for fine-pitch flip-chip applications. In this study, the interfacial reactions of Cu (60 (mu)m)/SnAg (20 (mu)m) double-bump flip chip assemblies with a 100 (mu)m pitch were investigated. Two types of thermal treatments, multiple reflows and thermal aging, were performed to evaluate the thermal reliability of Cu/SnAg flip-chip assemblies on organic printed circuit boards (PCBs). After these thermal treatments, the resulting intermetallic compounds (IMCs) were identified with scanning electron microscopy (SEM), and the contact resistance was measured using a daisy-chain and a four-point Kelvin structure. Several types of intermetallic compounds form at the Cu column/SnAg solder interface and the SnAg solder/Ni pad interface. In the case of flip-chip samples reflowed at 250 deg C and 280 deg C, Cu_(6)Sn_(5) and (Cu, Ni)_(6)Sn_(5) IMCs were found at the Cu/SnAg and SnAg/Ni interfaces, respectively. In addition, an abnormal Ag_(3)Sn phase was detected inside the SnAg solder. However, no changes were found in the electrical contact resistance in spite of severe IMC formation in the SnAg solder after five reflows. In thermally aged flip-chip samples, Cu_(6)Sn_(5) and Cu_(3)Sn IMCs were found at the Cu/SnAg interface, and (Cu, Ni)_(6)Sn_(5) IMCs were found at the SnAg/Ni interface. However, Ag_(3)Sn IMCs were not observed, even for longer aging times and higher temperatures. The growth of Cu_(3)Sn IMCs at the Cu/SnAg interface was found to lead to the formation of Kirkendall voids inside the Cu_(3)Sn IMCs and linked voids within the Cu_(3)Sn/Cu column interfaces. These voids became more evident when the aging time and temperature increased. The contact resistance was found to be nearly unchanged after 2000 h at 125 deg C, but increases slightly at 150 deg C, and a number of Cu/SnAg joints failed after 2000 h. This failure was caused by a reduction in the contact area due to the formation of Kirkendall and linked voids at the Cu column/Cu_(3)Sn IMC interface.
机译:Cu / SnAg双凸块结构是细间距倒装芯片应用的有希望的候选者。在这项研究中,研究了间距为100μm的Cu(60μm)/ SnAg(20μm)双凸块倒装芯片组件的界面反应。进行了两种类型的热处理,即多次回流和热老化,以评估有机印刷电路板(PCB)上的Cu / SnAg倒装芯片组件的热可靠性。经过这些热处理后,用扫描电子显微镜(SEM)鉴定了所得的金属间化合物(IMC),并使用菊花链和四点开尔文结构测量了接触电阻。在Cu柱/ SnAg焊料界面和SnAg焊料/ Ni焊盘界面处形成几种类型的金属间化合物。在倒装芯片样品在250℃和280℃回流的情况下,在Cu / SnAg和SnAg处发现了Cu_(6)Sn_(5)和(Cu,Ni)_(6)Sn_(5)IMC。 / Ni接口。另外,在SnAg焊料内部检测到异常的Ag_(3)Sn相。然而,尽管在五次回流后SnAg焊料中形成了严重的IMC,但仍未发现电接触电阻发生变化。在热老化的倒装芯片样品中,在Cu / SnAg界面处发现了Cu_(6)Sn_(5)和Cu_(3)Sn IMC,在(Cu,Ni)_(6)Sn_(5)IMC中发现了SnAg / Ni界面。但是,即使更长的老化时间和更高的温度,也未观察到Ag_(3)Sn IMC。发现Cu_(3)Sn IMC在Cu / SnAg界面处的生长导致在Cu_(3)Sn IMC内形成Kirkendall空隙以及在Cu_(3)Sn / Cu柱界面内的连接空隙。当老化时间和温度增加时,这些空隙变得更加明显。发现接触电阻在125摄氏度时2000 h之后几乎没有变化,但在150摄氏度时略有增加,并且2000 h之后许多Cu / SnAg接头失效。该失败是由于在铜柱/ Cu_(3)Sn IMC界面处形成了柯肯达尔和连接的空隙而导致的接触面积减少所致。

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