Hardness, intrinsic stress, structure of the a-C and a-C:H films prepared by magnetron sputtering

摘要

The 1.5-μm thick carbon films prepared by magnetron sputtering of a carbon target in Ar, Ar+CH{sub}4 and Ar+O{sub}2 gas mixtures show that the higher their intrinsic stress, the higher their microhardness and the lower their resistivity. The a-C films obtained without ion bombardment (unbiased; the mean free path of sputtered C atoms larger or equal to the cathode-anode distance) show microhardness up to 25GPa. The biased a-C films (i.e. with ion bombardment) achieve the highest microhardness (up to 50GPa) and the lowest resistivity (0.01Ωcm). An increase in Ar pressure, or the optional addition of O{sub}2， results in a decrease in the microhardness and intrinsic stress and an increase in the film resistivity. In comparison to a-C films, by adding CH{sub}4 to Ar up to certain limit, the microhardness and intrinsic stress of these a-C:H films increase and subsequently decrease steeply. It was specified by analysis of the electron diffraction patterns of thin films (30-60nm) deposited under the same conditions that the radius of the first co-ordination sphere of C atoms for all the films is in a good agreement with the value for graphite. The prime interplanar distance for biased a-C films is considerably lower than that for unbiased ones and for graphite. Our data indicate the sp{sup}2-bonded carbon structure of the deposited hard carbon films, in which the prime interplanar distance is reduced due to intrinsic stress. Thus, it is more suitable to explain the hardness origin as a consequence of the film nanostructure rather than the presence of sp{sup}3 bonds.