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Electron mobility in a modulation doped AlGaN/GaN quantum well

机译:调制掺杂的AlGaN / GaN量子阱中的电子迁移率

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We consider a two dimensional electron gas confined to a modulation doped AlGaN/GaN quantum well and study the dependence of low field mobility on various parameters such as composition, well width, remote impurity and interface roughness as a function of temperature. GaN is assumed to be in the zincblende structure. Acoustic and optical phonon, ionized remote impurity and interface roughness scatterings are taken into account in mobility calculations. The scattering rates are calculated using the self-consistently calculated wave functions obtained from the numerical solution of Poisson and Schr?dinger equations. Also found from the self-consistent solutions are the potential profile at the junction, the energy levels in the well and electron concentrations in each level. Ensemble Monte Carlo method is used to find the drift velocities of the two dimensional electrons along the interface under an applied field. The mobility of two dimensional electrons is obtained from the drift velocity of electrons. It is found that while remote impurity scattering is very effective for small values of spacer layer and doping concentrations, increasing Al concentration reduces the mobility of electrons. The effect of surface roughness, on the other hand, on mobility is almost independent of well width. The results of our simulations are compatible with the existing experimental data.
机译:我们考虑将二维电子气限制在调制掺杂的AlGaN / GaN量子阱中,并研究低场迁移率对各种参数(如成分,阱宽度,远端杂质和界面粗糙度)随温度的依赖性。假定GaN为闪锌矿结构。迁移率计算中考虑了声学和光学声子,电离的远程杂质和界面粗糙度散射。使用泊松和薛定Po方程的数值解获得的自洽计算的波函数来计算散射率。从自洽解中还可以找到结处的电位分布,阱中的能级和每个能级中的电子浓度。集合蒙特卡罗方法用于求二维电子在外加电场作用下沿界面的漂移速度。二维电子的迁移率是从电子的漂移速度获得的。已经发现,虽然远程杂质散射对于小间隔层和掺杂浓度非常有效,但是增加Al浓度会降低电子的迁移率。另一方面,表面粗糙度对迁移率的影响几乎与阱宽度无关。我们的模拟结果与现有的实验数据兼容。

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