机译:退火对VO_2薄膜的相变和热致变色性能的影响
Pohang Accelerator Laboratory POSTECH Pohang 37673 South Korea;
Pohang Accelerator Laboratory POSTECH Pohang 37673 South Korea Advanced Analysis Center Korea Institute of Science and Technology (KIST) Seoul 02792 South Korea;
Advanced Analysis Center Korea Institute of Science and Technology (KIST) Seoul 02792 South Korea;
Vanadium dioxide; Thin film; Phase transition;
机译:后热退火后VO_2薄膜的结构相控制和热致变色调节
机译:基于温度的拉曼散射和椭偏法分析热致变色VO_2薄膜的相变
机译:相变温度较低的ZnO:Al / VO_2双层薄膜的热致变色性能和低发射率
机译:热致变色的VO_2薄膜通过后退火处理v_2O_5薄膜制备
机译:薄膜和超薄膜的热机械性能和相变。
机译:具有出色的热致变色特性的各向异性二氧化钒雕刻薄膜
机译:V2O5薄膜后退火处理制备的热致变色VO2薄膜