METHOD OF MANUFACTURING A MAX PHASE THIN FILM, CAPABLE OF COATING WITH A TI2ALN MAX PHASE THIN FILM WITHOUT A POST-HEAT ANNEALING PROCESS

摘要

PURPOSE: A method of manufacturing an M A X phase thin film is provided to avoid a delamination phenomenon and a cracking of a thin film by occurring because a coefficient of a thermal expansion of a coating thin film and a base material is different among a post-heat annealing process by forming a MAX phase thin film of a crystalline in a temperature which is low in comparison with a post-heating temperature.;CONSTITUTION: A method of manufacturing an M A X phase thin film comprises the following steps: a target consisting of a Ti2AlN among a vacuum shocks with a plasma which discharges by using an inactive gas; and a base element coats with a Ti2AlN MAX phase thin film of a direct crystalline by releasing a metal material in an ion state from a target.;COPYRIGHT KIPO 2013