机译:相变对脉冲激光沉积ZnTiO_3薄膜光学和介电性能的影响
Department of Electronics & Communication Engineering, Malaviya National Institute of Technology, Jaipur, India,Department of Electronics & Communication Engineering, Swami Keshvanand Institute of Technology, Management & Gramothan, Jaipur, India;
Department of Electronics & Communication Engineering, Malaviya National Institute of Technology, Jaipur, India;
Department of Physics, Indian Institute of Technology Roorkee, Roorkee, India;
Pulsed Laser Deposition; ZnTiO3; Dielectric Properties; Phase transformation;
机译:激光注量对脉冲激光沉积Ba_(0.6)Sr_(0.4)TiO_3薄膜的结构,光学和微波介电性能的影响
机译:使用脉冲激光沉积(PLD)方法对沉积在不同单晶基板上的Y_(0.225)SR_(0.775)SR_(0.775)SR_(0.775)COO_3薄膜的结构,电介质,光学和电子性能。
机译:微波可调谐器件的脉冲激光沉积技术沉积Ba_(0.6)Sr_(0.4)Ti_(0.99)Fe_(0.01)O_3薄膜的介电和光学性能
机译:许多激光脉冲对由673K脉冲激光沉积(PLD)技术沉积的CuO薄膜光学性质的影响
机译:通过中和离子束溅射和脉冲激光沉积沉积的n型薄膜透明导电氧化物的电学和光学性质的制备和表征。
机译:飞秒脉冲激光沉积TiO2薄膜的相变形貌光学和电学性质
机译:许多激光脉冲对由673K脉冲激光沉积(PLD)技术沉积的CuO薄膜光学性质的影响
机译:脉冲激光辐照介质薄膜相变的拉曼研究