A Pulsed Laser Deposition Means For Thin Films With Homogeneous Properties And Thickness Over Large Area

摘要

PURPOSE: An apparatus is provided which obtains a large area thin film in a laser deposition process, and obtains a thin film having a constant thickness and uniformed physical properties over a large area of the film using a laser deposition process. CONSTITUTION: In a laser beam deposition equipment forming a thin film, the apparatus for depositing a large area thin film comprises a microwave generator irradiating microwaves(195) onto a substrate(105a) on which a thin film is deposited in a direction parallel to the surface of the substrate; and a resonator(133) evenly diffusing the plasma emitted on the surface of the substrate on the substrate by forming the microwaves(195) into stationary waves on the surface of the substrate(105a). The apparatus for depositing a large area thin film comprises a vacuum chamber(101); a target substrate(103) which is installed in the vacuum chamber, rotationally moved, and on which a deposition material is installed; a substrate mount(105) which is installed in the vacuum chamber with spaced apart from the target substrate in a certain distance, on which a substrate is installed, wherein a thin film is formed on the substrate, and which can be rotationally moved; a laser generator(111) capable of irradiating laser beams toward the target substrate; a microwave generator capable of emitting microwaves in a direction parallel to the surface of the substrate; and a resonance(133) forming the microwaves(195) into stationary waves on the surface of the substrate(105a).