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首页> 外文期刊>Romanian reports in physics >AZO THIN FILMS SYNTHESIZED BY RF-MAGNETRON SPUTTERING: THE ROLE OF DEPOSITION POWER
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AZO THIN FILMS SYNTHESIZED BY RF-MAGNETRON SPUTTERING: THE ROLE OF DEPOSITION POWER

机译:射频磁控溅射合成的偶氮薄膜:沉积功率的作用

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摘要

Transparent c-axis textured aluminum doped zinc oxide (AZO) films were deposited at room temperature onto glass substrates by radio-frequency magnetron sputtering. The effect of sputtering power on the properties of the AZO sputtered thin films was investigated. Our results indicated that the sputtering power has a great influence on the crystalline quality and electrical parameters of AZO films, thus being a useful tool for tuning their functional properties.
机译:在室温下,通过射频磁控溅射将透明的c轴纹理化的铝掺杂氧化锌(AZO)膜沉积到玻璃基板上。研究了溅射功率对AZO溅射薄膜性能的影响。我们的结果表明,溅射功率对AZO膜的晶体质量和电参数有很大影响,因此是调节其功能特性的有用工具。

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  • 来源
    《Romanian reports in physics》 |2014年第4期|993-1001|共9页
  • 作者单位

    University of Bucharest, Faculty of Physics, P.O. Box MG-11, RO-077125 Bucharest-Magurele, Romania,National Institute of Materials Physics, P.O. Box MG-7, RO-077125 Magurele-Ilfov, Romania;

    University of Bucharest, Faculty of Physics, P.O. Box MG-11, RO-077125 Bucharest-Magurele, Romania;

    University of Bucharest, Faculty of Physics, P.O. Box MG-11, RO-077125 Bucharest-Magurele, Romania;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    AZO thin films; magnetron sputtering; XRD; band gap; electrical parameters;

    机译:AZO薄膜;磁控溅射;XRD;带隙电气参数;

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