首页> 外文期刊>Romanian reports in physics >AZO thin films synthesized by rf-magnetron sputtering: the role of deposition power
【24h】

AZO thin films synthesized by rf-magnetron sputtering: the role of deposition power

机译:射频磁控溅射合成AZO薄膜:沉积功率的作用

获取原文
           

摘要

Transparent c-axis textured aluminum doped zinc oxide (AZO) films weredeposited at room temperature onto glass substrates by radio-frequency magnetronsputtering. The effect of sputtering power on the properties of the AZO sputtered thinfilms was investigated. Our results indicated that the sputtering power has a greatinfluence on the crystalline quality and electrical parameters of AZO films, thus being auseful tool for tuning their functional properties.
机译:通过射频磁控溅射在室温下将透明的c轴纹理化的铝掺杂氧化锌(AZO)膜沉积到玻璃基板上。研究了溅射功率对AZO溅射薄膜性能的影响。我们的结果表明,溅射功率对AZO膜的晶体质量和电学参数有很大的影响,因此是调节其功能特性的有用工具。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号