METHOD OF FORMING AN INORGANIC THIN FILM AND A SPUTTERING SYSTEM THEREFORE, CAPABLE OF EFFECTIVELY PROTECTING THE ORGANIC LAYER OF AN ORGANIC ELECTRONIC ELEMENT SINCE OXYGEN PERMEABILITY AND WATER PERMEABILITY ARE TOO LOW COMPARED WITH A THIN FILM SYNTHESIZED FROM SINGLE INORGANIC MATERIAL

摘要

PURPOSE: A method of forming an inorganic thin film and a sputtering system therefore are provided to effectively protect the organic layer of an organic electronic element since oxygen permeability and water permeability are too low compared with a thin film, which is synthesized from single inorganic material.;CONSTITUTION: A sputtering system for forming an inorganic thin film comprises a vacuum chamber(10), magnetron deposition sources(11), a substrate holder(13) and a power supply unit. The inside of the vacuum chamber is maintained in a vacuum state. The magnetron deposition sources deposit an inorganic thin film. The magnetron holder is installed on a position facing at least one of the magnetron deposition sources and holds a substrate. The substrate forms an organic-polymer protecting layer by coating photo-curable polymer and curing the coated photo-curable polymer. The power supply unit applies RF power and frequency to each of the magnetron deposition sources.;COPYRIGHT KIPO 2011