射频磁控溅射沉积系统制备BCN薄膜的研究

摘要

In nature,the diamond is the hardest materials,but it is easy to be oxidated in the high temperature,so it can’t be used to make cutting tools under the nature conditions.Cubic boron nitride has many excellent properties,but its internal stress is large,which largely affects its development in the industrial production.People expect to create a new ternary compound boron carbon and nitrogen material,and hope that the compound has the advantages of two substances original without their shortcomings. Boron carbon nitride films were deposited onto silicon substrates by medium frequency magnetron sputtering from graphite and boron targets with Ar and N2 as feedstock.By changing sputtering power of graphite target amorphous B-C-N thin films were synthesized on silicon substrate.The chemical bonding states,structure and morphology of B-C-N films were investigated by FTIR,AFM,and XRD analysis.%在自然界中,金刚石是最硬的一种材料,但把金刚石高温暴露在空气中时变得容易被氧化,所以在该条件下它不能用来做成切割工具。立方氮化硼有许多优异的特性,但它的内应力比较大,很大程度上影响了它在工业生产上的发展。人们期望能够合成出一种新的三元化合物硼碳氮材料,并且希望这种化合物既具有金刚石和 c-BN的优点而且还能克服2种物质原有的缺点。采用射频磁控溅射方法,以石墨靶材和甲烷气体作为碳源,通过调控石墨靶功率在硅基片上沉积非晶B-C-N薄膜。利用傅里叶变换红外光谱(FTIR),原子力显微镜(AFM),X 射线衍射(XRD),台阶仪等表征手段,分别对B-C-N薄膜的表面形貌粗糙度、成键、沉积速率进行分析。