首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Defect mediated modification of structural, optical and magnetic properties of Xe~(3+) ions irradiated GaN/sapphire films
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Defect mediated modification of structural, optical and magnetic properties of Xe~(3+) ions irradiated GaN/sapphire films

机译:缺陷介导的Xe〜(3+)离子辐照GaN /蓝宝石膜的结构,光学和磁性性质的修饰

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We report tailoring of structural, optical and magnetic properties of PLD grown GaN films by 500 keV Xe~(3+) ions at irradiation fluences of 1 × 10~(16) and 5 × 10~(16) ions-cm~(-2). Deterioration in the crystallinity is observed after irradiation; however, average apparent crystallite size is increased at fluence of 5 × 10~(16) compared to 1 × 10~(16) ions-cm~(-2). In pristine film, broad yellow luminescence peak at —2.2 eV along with characteristic peak at —3.4 eV has been observed by photoluminescence spectroscopy. Appearance of peaks at 2.06, 2.65 and 3.06 eV after irradiation suggests defect states generation within the band-gap. Origin of yellow luminescence in GaN films is attributed to Ga vacancy related defects, point defect complexes with unintentional impurities (C and O) on the surface. Lattice disorder examined by RBS/C supports the structural and optical measurements/observations. Films remain diamagnetic as investigated by SQUID magnetometer for all fluences as the concentration of defects is not sufficient to trigger ferromagnetism.
机译:我们报道了通过500 keV Xe〜(3+)离子在1×10〜(16)和5×10〜(16)离子-cm〜(-)的辐照通量下对PLD生长的GaN膜的结构,光学和磁性能的定制。 2)。辐照后观察到结晶度降低;但是,与1×10〜(16)离子-cm〜(-2)相比,平均表观晶粒尺寸在5×10〜(16)的注量下增加。在原始膜中,通过光致发光光谱法观察到在-2.2 eV处的宽黄色发光峰以及在-3.4 eV处的特征峰。辐照后在2.06、2.65和3.06 eV出现峰值表明在带隙内产生了缺陷状态。 GaN薄膜发黄光的原因归因于与Ga空位相关的缺陷,表面上带有意外杂质(C和O)的点缺陷复合物。 RBS / C检查的晶格异常支持结构和光学测量/观察。通过SQUID磁力计调查,由于缺陷浓度不足以触发铁磁性,因此薄膜对所有注量仍保持抗磁性。

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