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Failure analysis of GaAs microwave devices with plastic encapsulation by electro-optical techniques

机译:电光技术对塑料封装GaAs微波器件的失效分析

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摘要

GaAs devices technology used for space applications have failed before the required 1000h of the temperature humidity bias standard aging test. The results have shown that gate-source reverse bias is the most severe stress condition for transistors and also that capacitors are the most critical parts. This paper establishes an original method to analyze plastic encapsulated devices by combining different electro-optical techniques. Many of the possible faults in ICs are linked with local heat dissipation, such as shorts between lines, oxide or junction breakdowns. Infrared thermography is based on emissivity of a material at a given temperature in relation with Planck's law. This kind of system generates a temperature map image with a micrometric spatial resolution. Thanks to the transparency property of GaAs to near-infrared wavelengths, we propose a backside failure analysis of encapsulated devices and a precise localization of physical defects, without altering the surface. This methodology enables to make the link between electrical failure signatures and failure mechanisms of GaAs devices during aging tests.
机译:在要求的1000h的温度湿度偏置标准老化测试之前,用于太空应用的GaAs器件技术已经失败。结果表明,栅极-源极反向偏置是晶体管最严重的应力条件,电容器也是最关键的部分。本文通过结合不同的电光技术,建立了分析塑料封装器件的原始方法。 IC中许多可能的故障与局部散热有关,例如线路之间的短路,氧化物或结点击穿。红外热成像技术基于与普朗克定律相关的给定温度下材料的发射率。这种系统生成具有微米级空间分辨率的温度图图像。由于GaAs对近红外波长具有透明性,我们提出了封装器件的背面失效分析以及物理缺陷的精确定位,而无需改变表面。这种方法使老化测试期间的电气故障特征和GaAs器件的故障机制之间可以建立联系。

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  • 来源
    《Microelectronics & Reliability》 |2013年第11期|1375-1380|共6页
  • 作者单位

    IMS Laboratory, University Bordeaux 1, 351 Cours de la Liberation, 33405 Talence Cedex, France;

    IMS Laboratory, University Bordeaux 1, 351 Cours de la Liberation, 33405 Talence Cedex, France;

    IMS Laboratory, University Bordeaux 1, 351 Cours de la Liberation, 33405 Talence Cedex, France;

    IMS Laboratory, University Bordeaux 1, 351 Cours de la Liberation, 33405 Talence Cedex, France;

    Thales Research and Technology, 1 Avenue Augustin Fresnel, 91767 Palaiseau, France;

    Thales Research and Technology, 1 Avenue Augustin Fresnel, 91767 Palaiseau, France;

    Thales Alenia Space, 26 Avenue J.F. Champollion, BP 33787, 31037 Toulouse Cedex 1, France;

    Thales Alenia Space, 26 Avenue J.F. Champollion, BP 33787, 31037 Toulouse Cedex 1, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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