Design of low power, variation tolerant single bitline 9T SRAM cell in 16-nm technology in subthreshold region

摘要

The major design parameters of embedded cache memory (SRAM memory cell) are speed, power consumption, noise tolerance, and reliability. It is a challenging task to design an SRAM cell in the face of process, voltage, and temperature variations at low supply voltages. At scaled technology node the conventional 6T SRAM cell suffers from read and write failures as well as instability. Moreover, it is susceptible to multibit soft error rate since it does not support bit-interleaving architecture. This paper proposes a low-power robust single bitline 9T (nine transistor) SRAM (Static Random Access Memory) at a 16-nm technology node in the subthreshold region. The potency of the proposed cell is shown by comparing it with other recently published SRAM cells, namely, singleended NTV 9T (SENTV9T), write and read enhanced 9T (WREN9T), and the conventional 6T (CONV6T) SRAM cells. The proposed cell provides 1.25x/1.96 x lower read current IREAD variability compared with WREN9T/ SENTV9T. The proposed cell achieves 4.23 x higher noise tolerance capability (i.e., read static noise margin (RSNM)) during read operation compared with CONV6T due to the fact that it employs read decoupled operation. Moreover, SBL9T consumes lower standby power during hold state and dynamic power in the active state as compared with SENTV9T, WREN9T, and CONV6T. SBL9T also exhibits 10.01x/8.65x/11.47x narrower spread in standby power compared with CONV6T/WREN9T/SENTV9T. The dynamic power spread shows a similar trend with SBL9T providing 1.97x/1.02x narrower spread in dynamic power compared with WREN9T/ SENTV9T. These benefits however are achieved by the SBL9T at the cost of 1.28x/0.71x/1.01x longer read delay compared with CONV6T/WREN9T/SENTV9T.