首页> 外文期刊>Microelectronic Engineering >Fabrication of Coulomb blockade device utilizing the 0.34 nm interlayer spacing in a multiwalled carbon nanotube
【24h】

Fabrication of Coulomb blockade device utilizing the 0.34 nm interlayer spacing in a multiwalled carbon nanotube

机译:利用多壁碳纳米管中的0.34 nm夹层间距制造库仑阻挡器件

获取原文
获取原文并翻译 | 示例

摘要

The mechanism for electrical conduction between the layers of a multiwalled carbon nanotube (MWNT) is investigated. Enhancement of the longitudinal conductance of MWNTs is observed with increasing bias voltage. The effect is explained by a model, in which interlayer radial gaps (0.34 nm) are assumed to act as tunnel barriers. Based on this concept, we propose and demonstrate a novel nanosized tunnel device in a MWNT. Coulomb blockade oscillations with a charging energy of 15 meV are observed at 4.2 K, indicating that there is a tunneling barrier at the fine 0.34 nm interlayer spacing that is useful for tunnel junction device formation.
机译:研究了多壁碳纳米管(MWNT)各层之间的导电机理。随着偏置电压的增加,MWNTs的纵向电导得到增强。可以用一个模型来解释这种影响,在该模型中,假定层间径向间隙(0.34 nm)充当隧道势垒。基于此概念,我们提出并演示了一种在MWNT中使用的新型纳米隧道装置。在4.2 K处观察到库仑阻塞振动,其充电能量为15 meV,这表明在0.34 nm的精细层间间距处存在隧道势垒,可用于形成隧道结器件。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号