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机译:EUV光掩模减轻缺陷的注意事项
Carl Zeiss SMS, Carl-Zeiss-Promenade 10, 07745 Jena, Germany;
Carl Zeiss SMS, Carl-Zeiss-Promenade 10, 07745 Jena, Germany;
Carl Zeiss SMS, Carl-Zeiss-Promenade 10, 07745 Jena, Germany;
Carl Zeiss SMS, Carl-Zeiss-Promenade 10, 07745 Jena, Germany;
Carl Zeiss SMS, Carl-Zeiss-Promenade 10, 07745 Jena, Germany;
Carl Zeiss SMS, Carl-Zeiss-Promenade 10, 07745 Jena, Germany;
Carl Zeiss SMS, Carl-Zeiss-Promenade 10, 07745 Jena, Germany;
Intel assignee at SEMATECH, 257 Fuller Road, 12203 Albany, New York, United States;
extreme ultraviolet detectivity; extreme ultraviolet photomask; defect mitigation; blank inspection; review; compensational repair; shadowing effects; AIMS™; extreme ultraviolet;
机译:EUV投票制版光刻技术可减轻印刷掩模缺陷,改善CDU并减少随机故障
机译:通过EUV图案晶圆的全芯片光学检测来检测可印刷的EUV掩模吸收层缺陷和缺陷添加物
机译:凸版印刷开发下一代EUV光掩模
机译:与EUV Photomask相关的挑战和考虑因素缺陷和修复
机译:用于光刻的DUV和EUV光掩模中非平面相和多层缺陷的快速仿真方法。
机译:甲醇缓解在制造水果烈酒期间特别考虑新的咖啡樱桃烈酒
机译:减轻EUV面罩缺陷的综合缺陷避免框架