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Injection-induced bandgap narrowing and its effects on the low-temperature operation of silicon bipolar transistors

机译:注入引起的带隙变窄及其对硅双极晶体管的低温工作的影响

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The authors present evidence that injection-induced bandgap narrowing plays an important role in determining the low-temperature properties of silicon bipolar transistors. This phenomenon occurs when large concentrations of minority-carrier charge are injected into the quasi-neutral base region of the device under high-current conditions. A significant enhancement in the low-temperature transistor current gain in the high-current regime is produced that is unaccounted for in conventional device theory. Comparison of theoretical calculations as well as phenomenological modeling results to measured data supports the authors' claims. The analysis suggests that an understanding of injection-induced bandgap narrowing is required for accurate modeling of bipolar transistors, particularly when they are used in low-temperature applications.
机译:作者提供的证据表明,注入引起的带隙变窄在确定硅双极晶体管的低温特性方面起着重要作用。当在高电流条件下将大浓度的少数载流子电荷注入器件的准中性基极区域时,会发生此现象。产生了在大电流状态下低温晶体管电流增益的显着提高,这是常规器件理论中无法解释的。理论计算和现象学建模结果与实测数据的比较支持了作者的主张。分析表明,对双极性晶体管的精确建模需要了解注入引起的带隙变窄,特别是在低温应用中。

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