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Sb-rich Si–Sb–Te Phase-Change Material for Phase-Change Random Access Memory Applications

机译:用于相变随机存取存储器应用的富Sb的Si-Sb-Te相变材料

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An Sb-rich (48 at.%) Si–Sb–Te phase-change material with moderate Si content (24 at.%) is proposed for phase-change random access memory (PCRAM) applications. The real time amorphous to crystalline transformation was studied by in situ transmission electron microscopy observations and in situ resistance measurements. The results of time-dependent resistance measurements show that the $hbox{Si}_{24}hbox{Sb}_{48} hbox{Te}_{28}$ phase-change material has data retention of 10 years at about 382 K, suggesting a more stable amorphous state than the usual $hbox{Ge}_{2}hbox{Sb}_{2} hbox{Te}_{5}$ (GST) phase-change material. The reversible set –reset ability of the PCRAM cell based on the $hbox{Si}_{24}hbox{Sb}_{48}hbox{Te}_{28}$ phase-change material is much better than that of the device employing GST. The programming cycles can reach $hbox{2.2} times hbox{10}^{4}$ under a set pulse of 1.5 V/1000 ns with a 30-ns falling edge and a reset pulse of 3.5 V/400 ns, whereas the resistance contrast retains a value of as large as two orders of magnitude.
机译:对于相变随机存取存储器(PCRAM)应用,提出了具有中等Si含量(24 at。%)的富含Sb(48 at。%)的Si-Sb-Te相变材料。通过原位透射电子显微镜观察和原位电阻测量研究了实时无定形到结晶的转变。随时间变化的电阻测量结果表明,$ hbox {Si} _ {24} hbox {Sb} _ {48} hbox {Te} _ {28} $相变材料在382年的数据保留时间为10年K,表明比通常的$ hbox {Ge} _ {2} hbox {Sb} _ {2} hbox {Te} _ {5} $(GST)相变材料更稳定的非晶态。基于$ hbox {Si} _ {24} hbox {Sb} _ {48} hbox {Te} _ {28} $相变材料的PCRAM单元具有可逆的置位-复位能力,比相变材料要好得多。使用GST的设备。在设置电压为1.5 V / 1000 ns,下降沿为30 ns,复位脉冲为3.5 V / 400 ns的情况下,编程周期可以达到$ hbox {2.2}乘以hbox {10} ^ {4} $。电阻对比保留了两个数量级的值。

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