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A Comprehensive Compact Model for GaN HEMTs, Including Quasi-Steady-State and Transient Trap-Charge Effects

机译:GaN HEMT的全面紧凑模型,包括准稳态和瞬态陷阱电荷效应

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摘要

A comprehensive scalable trap-charge model for the dc and pulsed – modeling of GaN high electron-mobility transistor is presented. While interface traps are considered for dc – modeling, surface states and traps in the AlGaN barrier and GaN buffer are considered for the pulsed – model. A surface-potential-based model is presented for interface traps, which is then adapted to the current model for the dc modeling. For the pulsed – modeling, a semiempirical approach is proposed for gate lag as well as both gate-lag and drain-lag conditions. The model is able to capture the effects of gate ( and drain ( quiescent biases as well as the stress time (, and is validated with both numerical simulation and measurement data. Finally, for the accurate transient simulations in switching applications, the emission of electrons is also modeled in Verilog-A using an asymptotic solution of a differential equation, which can be a better alternative to that of the subcircuit approach.
机译:提出了针对GaN高电子迁移率晶体管的直流和脉冲建模的综合可扩展陷阱电荷模型。 dc建模考虑了界面陷阱,而脉冲模型则考虑了AlGaN势垒和GaN缓冲器中的表面状态和陷阱。提出了用于界面陷阱的基于表面电势的模型,然后将其调整为适用于dc建模的当前模型。对于脉冲建模,提出了一种半经验方法来处理栅极滞后以及栅极滞后和漏极滞后情况。该模型能够捕获栅极(和漏极)(静态偏置以及应力时间)的影响,并通过数值模拟和测量数据进行了验证。最后,对于开关应用中的准确瞬态仿真,电子的发射在Verilog-A中,还使用微分方程的渐近解对其进行建模,这可以更好地替代子电路方法。

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