首页> 外文期刊>IEEE Transactions on Electron Devices >Nanotube Tunneling FET With a Core Source for Ultrasteep Subthreshold Swing: A Simulation Study
【24h】

Nanotube Tunneling FET With a Core Source for Ultrasteep Subthreshold Swing: A Simulation Study

机译:具有超陡亚阈值摆幅核心源的纳米管隧穿FET:仿真研究

获取原文
获取原文并翻译 | 示例

摘要

In this article, we propose a novel nanotube (NT) tunneling field-effect transistor with a core source (CSNT-TFET) which uses line tunneling. We systematically investigate the CSNT-TFET with the help of calibrated 3-D simulations and demonstrate that it outperforms the conventional NT-TFET in terms of both static and dynamic performance. We show that the CSNT-TFET exhibits a reduced average subthreshold swing (SS) of 33 mV/decade with Ge-source for more than eight orders of magnitude of drain current at an ultralow supply voltage (V-DS = 0.3 V). In addition, the ON-state current of the CSNT-TFET is enhanced by similar to 13 timeswith Si-source and by similar to 6 times with Ge-source even at V-DS = V-GS = 0.3 V when compared with the NT-TFET. Without the use of any exotic material for the source and channel regions, the CSNT-TFET offers an impact ionization MOS-like steep SS (a minimum SSpoint of similar to 1 mV/decade) and a high ON-state current of similar to 10(-6) A for V-DS = V-GS = 0.3 V. Furthermore, the impact of the gate sidewall spacer and source diameter on the performance of the CSNT-TFET is also investigated.
机译:在本文中,我们提出了一种新型的具有芯线源(CSNT-TFET)的纳米管(NT)隧穿场效应晶体管,该晶体管使用线隧穿。我们借助校准的3D仿真系统地研究了CSNT-TFET,并证明它在静态和动态性能方面均优于传统的NT-TFET。我们表明,在超低电源电压(V-DS = 0.3 V)下,对于Ge源,CSNT-TFET的平均亚阈值摆幅(SS)降低了33 mV /十倍,漏电流超过八个数量级。此外,与NT相比,即使在V-DS = V-GS = 0.3 V的情况下,与Si源相比,CSNT-TFET的导通电流也提高了约13倍,而与Ge源相比提高了约6倍-TFET。在源极和沟道区域不使用任何异质材料的情况下,CSNT-TFET提供了类似于冲击电离MOS的陡峭SS(最小SSpoint类似于1 mV /十倍)和高ON态电流,类似于10 (-6)V-DS = V-GS = 0.3 V时的A。此外,还研究了栅极侧壁隔离层和源极直径对CSNT-TFET性能的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号