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Leakage-current-induced hot-carrier degradation of p-channel MOSFETs

机译:漏电流引起的p沟道MOSFET热载流子退化

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Leakage-current-induced hot-carrier effects have been observed during stressing of p-channel MOSFETs in the OFF state with V/sub GS/<0 V and V/sub DS/>0 V. This mode of stressing results in increased leakage current and a positive shift in the value of V/sub GS/, corresponding to the onset of avalanche breakdown of the drain junction. These effects are related to generation of interface states near the drain in forward-mode operation. By comparison, conventional stressing in the ON state with V/sub GS/>0 V and V/sub DS/>0 V resulted in little change in these p-channel MOSFET characteristics.
机译:在V / sub GS / <0 V和V / sub DS /> 0 V的OFF状态下对p沟道MOSFET施加应力期间,已经观察到漏电流引起的热载流子效应。这种应力模式导致漏电流增加电流和V / sub GS /值的正向偏移,对应于漏极结的雪崩击穿。这些影响与正向工作时漏极附近的界面状态的产生有关。相比之下,V / sub GS /> 0 V和V / sub DS /> 0 V的导通状态下的常规应力导致这些p沟道MOSFET特性的变化很小。

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