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High-gain W band pseudomorphic InGaAs power HEMTs

机译:高增益W波段伪态InGaAs功率HEMT

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The authors have fabricated 0.1- mu m T-gate pseudomorphic (PM) InGaAs power high-electron-mobility transistors (HEMTs) with record power and gain performance at 94 GHz. Devices with 40- mu m gate peripheries achieved 10.6-mW output power with 7.3-dB gain and 14.3% power-added efficiency (PAE). Devices with 160- mu m gate peripheries achieved 62.7-mW output power with 4.0-dB gain and 13.2% PAE. The authors believe the superior performance of these devices is due to the combination of a short 0.1- mu m T-gate, high-quality material, optimized device profile, and the reduction in source inductance due to source vias.
机译:这组作者制造了0.1微米的T栅极假晶(PM)InGaAs功率高电子迁移率晶体管(HEMT),在94 GHz时具有创纪录的功率和增益性能。栅极外围面积为40μm的设备可实现10.6 mW的输出功率,7.3 dB的增益和14.3%的功率附加效率(PAE)。栅极外围面积为160μm的器件可实现62.7 mW的输出功率,增益为4.0 dB,PAE为13.2%。作者认为,这些器件的卓越性能归因于短的0.1微米T型栅极,高质量的材料,优化的器件外形以及源极过孔带来的源极电感的降低。

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