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W-band Penta-Composite Channel InAlAs/InGaAs Metamorphic HEMT for High Power Application and Comparison with Pseudomorphic HEMT

机译:用于高功率应用的W波段五复合通道InAlAs / InGaAs变质HEMT及其与拟态HEMT的比较

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Advance device design of novel penta-composite channel of 0.25 urn InAlAs/InGaAs MHEMT has been reported for the first time in composite channel HEMT. Highest Indium mole fraction of 0.78 in channel and total channel thickness of 140 A was found to be an optimized structure. It has both higher ID of 1029 mA/mm and flatterer gm of 648 mS/mm at VDS of 1.3 V. AC analysis results fT of 125 GHz andfmwc of 250 GHz, which makes the device useful for W-band Power amplifier applications. Comparison between MHEMT and PHEMT has also been emphasized with respect to transconductance (gj and drain current (ID).
机译:在复合通道HEMT中,首次报道了新型的0.25微米InAlAs / InGaAs MHEMT五复合通道的先进装置设计。发现通道中的最高铟摩尔分数为0.78,总通道厚度为140 A,是一种优化的结构。它在1.3 V的VDS时具有更高的ID(1029 mA / mm)和更平坦的gm(648 mS / mm)。AC分析结果的fT为125 GHz,fmwc为250 GHz,这使得该器件可用于W波段功率放大器应用。关于跨导(gj和漏极电流(ID)),还强调了MHEMT和PHEMT之间的比较。

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