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首页> 外文期刊>IEEE Electron Device Letters >High-power V-band pseudomorphic InGaAs HEMT
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High-power V-band pseudomorphic InGaAs HEMT

机译:大功率V波段伪非晶InGaAs HEMT

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摘要

The author's present the DC and RF power performance of planar-doped channel InGaAs high-electron-mobility transistors (HEMTs). The planar-doped channel (PDC) pseudomorphic GaAs HEMT with 400 mu m of gate width exhibited an output power of 184 mW, corresponding to 460 mW/mm, with 4.6-dB saturation gain and 25% power-added efficiency at 55 GHz. Although higher power density is possible, the authors have designed the device to operate at less than 500 mW/mm for thermal and reliability reasons. Devices with unit gate finger widths ranging from 30 to 50 mu m were fabricated and characterized, with no performance degradation observed from using the longer gate fingers.
机译:作者介绍了平面掺杂沟道InGaAs高电子迁移率晶体管(HEMT)的DC和RF功率性能。栅极宽度为400μm的平面掺杂沟道(PDC)伪GaAs HEMT的输出功率为184 mW(相当于460 mW / mm),在55 GHz时具有4.6dB的饱和增益和25%的功率附加效率。尽管可以实现更高的功率密度,但出于散热和可靠性的考虑,作者将设备设计为以低于500 mW / mm的速度工作。制造并表征了单位栅指宽度为30至50μm的器件,并且使用较长的栅指不会导致性能下降。

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