首页> 外文期刊>IEEE Electron Device Letters >0.10 /spl mu/m graded InGaAs channel InP HEMT with 305 GHz f/sub T/ and 340 GHz f/sub max/
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0.10 /spl mu/m graded InGaAs channel InP HEMT with 305 GHz f/sub T/ and 340 GHz f/sub max/

机译:0.10 / spl mu / m的InGaAs通道InP HEMT,具有305 GHz f / sub T /和340 GHz f / sub max /

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We report here 305 GHz f/sub T/, 340 GHz f/sub max/, and 1550 mS/mm extrinsic g/sub m/ from a 0.10 /spl mu/m In/sub x/Ga/sub 1-x/As/In/sub 0.62/Al/sub 0.48/As/InP HEMT with x graded from 0.60 to 0.80. This device has the highest f/sub T/ yet reported for a 0.10 /spl mu/m gate length and the highest combination of f/sub T/ and f/sub max/ reported for any three-terminal device. This performance is achieved by using a graded-channel design which simultaneously increases the effective indium composition of the channel while optimizing channel thickness.
机译:我们在这里报告305 GHz f / sub T /,340 GHz f / sub max /和1550 mS / mm外在g / sub m /从0.10 / spl mu / m In / sub x / Ga / sub 1-x / As / In / sub 0.62 / Al / sub 0.48 / As / InP HEMT,x的等级为0.60至0.80。该器件的f / sub T /最高,栅极长度为0.10 / spl mu / m,据报道,三端器件的f / sub T /和f / sub max /最高。此性能是通过使用渐变通道设计实现的,该设计可在优化通道厚度的同时增加通道的有效铟成分。

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