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首页> 外文期刊>IEEE Electron Device Letters >Gate-induced floating body effect excess noise in partially depleted SOI MOSFETs
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Gate-induced floating body effect excess noise in partially depleted SOI MOSFETs

机译:栅极感应的浮体会在部分耗尽的SOI MOSFET中产生过多的噪声

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摘要

Low frequency excess noise associated to gate-induced floating body effect is for the first time reported in Partially Depleted SOI MOSFETs with ultrathin gate oxide. This was investigated with respect to floating body devices biased in linear regime. Due to a body charging from the gate, a Lorentzian-like noise component superimposes to the conventional 1/f noise spectrum. This excess noise exhibits the same behavior as the Kink-related excess noise previously observed in Partially Depleted devices in saturation regime.
机译:与栅极诱导的浮体效应相关的低频多余噪声首次在具有超薄栅极氧化物的部分耗尽SOI MOSFET中得到报道。关于偏向于线性状态的浮体装置,对此进行了研究。由于来自门的物体充电,类洛伦兹噪声分量叠加到常规的1 / f噪声谱上。这种过量噪声表现出与先前在饱和状态下的部分耗尽型器件中观察到的与扭结相关的过量噪声相同的行为。

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