Effect of starting SOI material quality on low-frequency noise characteristics in partially depleted floating-body SOI MOSFETs

摘要

The low-frequency noise properties of partially-depleted (PD) floating-body silicon-on-insulator (SOI) MOSFETs fabricated on two types of commercially available bonded SOI (BSOI) wafers were experimentally investigated. In the pre-kink region, a drain bias dependent Lorentzian-like noise has been observed for UNIBOND wafers, while a pure 1/f noise has been achieved for ELTRAN wafers. Our analysis shows that the charge fluctuation induced by emission process through intermediate-level centers in the drain-depletion region causes the instability in the body voltage, resulting in the pre-kink excess noise for UNIBOND wafers.