首页> 外文期刊>IEEE Electron Device Letters >Resistive Memory Switching of $hbox{Cu}_{x}hbox{O}$ Films for a Nonvolatile Memory Application
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Resistive Memory Switching of $hbox{Cu}_{x}hbox{O}$ Films for a Nonvolatile Memory Application

机译:非易失性存储器应用的$ hbox {Cu} _ {x} hbox {O} $膜的电阻式存储器切换

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摘要

Poly crystalline CuxO films produced by plasma oxidation are investigated for nonvolatile memory applications. Reversible bistable resistive switching from a high-resistance state to a low-resistance state, and vice versa, is observed in an integrated Al/CuxO/Cu structure under voltage sweeping. More than 3000 repetitive cycles are observed in 180-mum memory devices with an on/off ratio of ten times. Data testing shows that the devices meet the ten-year retention requirement for the storage of programmed logic signals.
机译:研究了通过等离子氧化生产的多晶CuxO膜用于非易失性存储应用。在电压扫描下,在集成的Al / CuxO / Cu结构中观察到了从高电阻状态到低电阻状态的可逆双稳态电阻切换,反之亦然。在180个存储设备中观察到3000个以上的重复周期,其开/关比为10倍。数据测试表明,这些器件满足了存储已编程逻辑信号的十年保留要求。

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