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On the Response Time of Thin-Film Silicon Lateral Metal-Semiconductor-Metal Photodetectors

机译:薄膜硅横向金属-半导体-金属光电探测器的响应时间

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In this letter, we study the response time characteristics of lateral hydrogenated amorphous silicon (a-Si:H) and nanocrystalline silicon metal-semiconductor-metal (MSM) photodetectors. Devices with response time of (71~mu s) under green light illumination with (lambda =525~nm) (the wavelength of choice for indirect X-ray imaging) have been fabricated. The results show 42-fold and 4.2-fold improvement over the state of art single layer a-Si:H and double layer a-Si:H/molybdenum-disulphide (MoS2) MSM detectors, respectively.
机译:在这封信中,我们研究了横向氢化非晶硅(a-Si:H)和纳米晶体硅金属-半导体-金属(MSM)光电探测器的响应时间特性。已经制造出在(λ= 525〜nm)(间接X射线成像的选择波长)的绿光照射下响应时间为(71μs)的器件。结果显示,分别比现有的单层a-Si:H和双层a-Si:H /二硫化钼(MoS 2 )MSM检测器提高42倍和4.2倍。

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