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首页> 外文期刊>IEEE Electron Device Letters >System On Microheater for On-Chip Annealing of Defects Generated by Hot-Carrier Injection, Bias Temperature Instability, and Ionizing Radiation
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System On Microheater for On-Chip Annealing of Defects Generated by Hot-Carrier Injection, Bias Temperature Instability, and Ionizing Radiation

机译:片上退火系统,用于热载流子注入,偏置温度不稳定性和电离辐射所产生的缺陷的片上退火

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摘要

An on-chip immune system against hot-carrier stress, bias temperature instability, and total ionizing dose degradation is presented. A system on microheater provides defect annealing capability for recovering bulk trapped charges and interface states. The microheater and the system-on-chip are fabricated separately and stacked into a single package, which can be implemented on any arbitrary commercial-off-the-shelf device as a generic approach. The device annealed at 200 °C for 3 h results in sufficient recovery in drain current versus gate voltage characteristics.
机译:提出了一种针对热载流子应力,偏置温度不稳定性和总电离剂量降低的芯片免疫系统。微型加热器上的系统可提供缺陷退火功能,以恢复大量捕获的电荷和界面状态。微型加热器和片上系统分别制造,然后堆叠成一个封装,可以作为通用方法在任何现货供应的现成设备上实现。该器件在200°C下退火3小时,可以使漏极电流相对于栅极电压的特性得到足够的恢复。

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