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首页> 外文期刊>Applied Surface Science >Silver nanopillar coatings grown by glancing angle magnetron sputtering for reducing multipactor effect in spacecrafts
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Silver nanopillar coatings grown by glancing angle magnetron sputtering for reducing multipactor effect in spacecrafts

机译:通过瞥见角度磁控溅射来减少宇宙飞船中的多移液器效应而生长的银纳米玻璃涂层

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摘要

We have studied nanometric high aspect ratio Ag nanopillar coatings exhibiting reduced secondary electron emission for the mitigation of multipactor effect in radio-frequency space devices of high frequency and high power. The Ag nanopillars have been grown by glancing angle deposition with DC magnetron sputtering. Some samples have been covered by a gold capping layer to reduce oxidation and aging effects. The secondary emission yield of the surfaces of these samples has been measured and compared to those of flat Ag and Au reference samples. The results show that high aspect ratio surface roughness at the nanometer scale significantly reduce the secondary emission yield of the surface. This reduction is more important for low electron energies, which is the most influencing energy range of electrons for multipactor. The multipactor region for the nanopillar coating presenting the best secondary emission yield properties has been simulated, finding practical suppression of multipactor effect. The high-frequency surface resistance of these samples has also been estimated from published computations for similar surface roughness patterns. It was found that such nanopillar coatings are compatible with the best accomplishments of present space industry.
机译:我们研究了纳米型高纵横比AG纳米玻璃涂层,该纳米粉涂层表现出降低的二次电子发射,用于减轻高频和高功率的射频空间器件中的多移能器效应。通过用DC磁控溅射透明角沉积而生长Ag纳米玻璃。一些样品已被金覆盖层覆盖,以减少氧化和老化效果。已经测量并将这些样品的表面的二次排放产率与平均Ag和Au参考样品进行了比较。结果表明,纳米级的高纵横比表面粗糙度显着降低了表面的二次排放产率。这种减少对于低电子能量来说更为重要,这是多移能势的电子电能范围最多。已经模拟了用于呈现最佳二级排放产率特性的纳米玻璃涂层的多移膜区域,发现了多移体效应的实际抑制。这些样品的高频表面电阻也估计了来自类似表面粗糙度模式的公开计算。发现这种纳米粉涂层与现有空间工业的最佳成就相容。

著录项

  • 来源
    《Applied Surface Science》 |2020年第1期|146699.1-146699.9|共9页
  • 作者单位

    Univ Autonoma Madrid CEI UAM CSIC Dept Fis Aplicada Francisco Tomas & Valiente 7 E-28049 Madrid Spain|Univ Autonoma Madrid CEI UAM CSIC Inst Nicolas Cabrera Francisco Tomas & Valiente 7 E-28049 Madrid Spain;

    CEI UAM CSIC IMN CNM Inst Micro & Nanotecnol Isaac Newton 8 E-28760 Madrid Spain;

    CEI UAM CSIC IMN CNM Inst Micro & Nanotecnol Isaac Newton 8 E-28760 Madrid Spain;

    Univ Autonoma Madrid CEI UAM CSIC Dept Fis Aplicada Francisco Tomas & Valiente 7 E-28049 Madrid Spain|Univ Autonoma Madrid CEI UAM CSIC Inst Nicolas Cabrera Francisco Tomas & Valiente 7 E-28049 Madrid Spain;

    CEI UAM CSIC IMN CNM Inst Micro & Nanotecnol Isaac Newton 8 E-28760 Madrid Spain;

    CEI UAM CSIC IMN CNM Inst Micro & Nanotecnol Isaac Newton 8 E-28760 Madrid Spain;

    Univ Autonoma Madrid CEI UAM CSIC Dept Fis Aplicada Francisco Tomas & Valiente 7 E-28049 Madrid Spain|Univ Autonoma Madrid CEI UAM CSIC Inst Nicolas Cabrera Francisco Tomas & Valiente 7 E-28049 Madrid Spain;

    Univ Autonoma Madrid CEI UAM CSIC Dept Fis Aplicada Francisco Tomas & Valiente 7 E-28049 Madrid Spain|Univ Autonoma Madrid CEI UAM CSIC Inst Nicolas Cabrera Francisco Tomas & Valiente 7 E-28049 Madrid Spain;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Secondary electron emission; Anti-multipactor coatings; Ag nanopillars; Glancing angle deposition; Magnetron sputtering;

    机译:二次电子发射;抗多移膜涂层;Ag纳米玻璃;瞥见角度沉积;磁控溅射;

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