机译:直流磁控溅射技术合成的a-Si_(1-x)C_x:H薄膜的结构和光学性质
Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers, Algeria;
Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers, Algeria;
Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers, Algeria;
Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers, Algeria;
Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers, Algeria;
Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers, Algeria;
Houari Boumediene Science and Technology University (USTHB), Physics Faculty, Algiers, Algeria;
Houari Boumediene Science and Technology University (USTHB), Physics Faculty, Algiers, Algeria;
Houari Boumediene Science and Technology University (USTHB), Physics Faculty, Algiers, Algeria;
Algerian Nuclear Research Center (CRNA), Algiers, Algeria;
rnSilicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers, Algeria;
Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers, Algeria;
silicon carbide; sputtering; amorphous film; structure; luminescence; SIMS;
机译:d.c的富硅a-Si_(1-x)C_x薄膜磁控溅射硅和碳化硅的共溅射:结构和光学性质
机译:通过Si和6H-SiC共溅射制备的a-Si_(1-x)C_x:H薄膜的研究性质
机译:直流反应磁控溅射合成Cd取代ZnO(Zn_(1-x)Cd_xO)薄膜的结构和光学性能
机译:RF磁控溅射A-Si_(1-X)C_X:H薄膜的光学性质和结构
机译:研究磁控溅射生产的氧化锌基薄膜的结构,电,光和磁性能。
机译:磁控溅射对CdTe薄膜微结构光学和电学性质的基靶距离调节
机译:SRTI 1- x sum> sc x sum> o 3 sub>薄膜的结构和光学性质由RF磁控溅射制备
机译:反应直流磁控溅射合成混合价铼氧化物薄膜的光化学性质。