FILM FORMED BY OPTICAL THIN FILM FOR HIGH PERFORMANCE VACUUM ULTRAVIOLET WAVELENGTH RANGE BY REACTIVE DC MAGNETRON SPUTTERING METHOD

摘要

PROBLEM TO BE SOLVED: To reduce an absorption scattered in an interface between a film and a substrate when a fluoride optical thin film for a vacuum ultraviolet wavelength range to a fluoride substrate is formed by reactive DC sputtering. ;SOLUTION: The optical thin film deals with a high performance vacuum ultraviolet wavelength range, and can be formed by removing an absorption factor scattered in an interface between the film and the substrate such as an organic material or the like on the surface of the substrate. A cleaning step of the substrate is filled in-situ before a film forming step in a vacuum film forming chamber of a reactive DC magnetron sputtering apparatus. In this apparatus, a gas having a cleaning effect or a reactive gas at a film forming time is separated and can be introduced, and effects of stability of discharging, suppressing of a damage of a plasma can be performed.;COPYRIGHT: (C)2004,JPO