机译:氢流量对Si(111)衬底上3C-SiC异质外延层生长的影响
Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China;
Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China;
State Grid Smart Grid Res Inst, Elect Engn New Mat & Microelect Dept, Beijing 100192, Peoples R China;
State Grid Smart Grid Res Inst, Elect Engn New Mat & Microelect Dept, Beijing 100192, Peoples R China;
Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China;
Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China;
Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China;
Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China|Dongguan Tianyu Semicond Inc, Dongguan 523000, Peoples R China;
Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China;
3C-SiC film; Chemical vapor deposition; Heteroepitaxial growth; H-2 flow rate;
机译:a-SiC衬底上3C-SiC(111)异质外延层中双边界消除的机理
机译:生长前衬底氮化对ECR-MBE在Si(001)和Si(111)衬底上生长的GaN异质外延层初始生长过程的影响
机译:通过化学气相沉积在晶格匹配良好的(110)Si衬底上异质外延生长(111)3C-SiC
机译:使用AIN作为缓冲层在Si(111)衬底上异质外延生长3C-SiC
机译:使用常规和五极外延生长工艺在氢(6)-碳化硅(0001)和硅(111)衬底上生长氮化镓和氮化铝镓薄膜。
机译:Si(111)衬底上异质外延生长3C-SiC的动力学表面粗糙化和晶圆弯曲控制
机译:氢流量对Si(111)衬底上3C-SiC异质外延层生长的影响