机译:气相沉积聚合法制备的聚酰亚胺-Co颗粒薄膜的室温磁阻
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan;
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan;
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan;
Department of Materials Science and Engineering, Faculty of Engineering, Nagasaki University, 1-14 Bunkyo-machi, Nagasaki 852-8521, Japan;
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan;
机译:气相沉积聚合法制备的聚酰亚胺-Co颗粒薄膜的室温磁阻
机译:退火对聚酰亚胺-Co颗粒薄膜隧道磁阻的影响
机译:SINX和等离子体聚合物层的室温沉积用于柔性多层阻挡膜通过等离子体增强化学气相沉积方法
机译:颗粒状铜膜的化学气相沉积和磁阻
机译:通过聚合物源化学气相沉积合成的非晶碳化硅和碳氮化硅薄膜的表征。机械结构和金属界面性能
机译:雾化学气相沉积合成高温稳定锐钛矿相二氧化钛薄膜
机译:气相沉积聚合法制备的聚酰亚胺-Co颗粒薄膜的室温磁阻