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HIGH GROWTH RATE HOMOEPITAXIAL DIAMOND FILM DEPOSIHIGH GROWTH RATE HOMOEPITAXIAL DIAMOND FILM DEPOSITION AT HIGH TEMPERATURES BY MICROWAVE PLASMA-ASSITION AT HIGH TEMPERATURES BY MICROWAVE PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION STED CHEMICAL VAPOR DEPOSITION
HIGH GROWTH RATE HOMOEPITAXIAL DIAMOND FILM DEPOSIHIGH GROWTH RATE HOMOEPITAXIAL DIAMOND FILM DEPOSITION AT HIGH TEMPERATURES BY MICROWAVE PLASMA-ASSITION AT HIGH TEMPERATURES BY MICROWAVE PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION STED CHEMICAL VAPOR DEPOSITION
The deposition of high quality diamond films at high linear growth rates and substrate temperatures for microwave-plasma chemical vapor deposition is disclosed. The linear growth rate achieved for this process is generally greater than 50 mu m/hr for high quality films, as compared to rates of less than 5 mu m/hr generally reported for MPCVD processes.
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