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Change of high-voltage conduction mechanism in vertical GaN-on-GaN Schottky diodes at elevated temperatures

机译:升高温度下垂直GaN-On-GaN肖特基二极管高压传导机制的变化

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摘要

Current-voltage-temperature characteristics (0 degrees C to 150 degrees C) of SBDs on highly compensated 15 mu m and 30 mu m n-type GaN drift layer were measured for voltages up to -300 V and up to -800 V, respectively. When the temperature is between 75 degrees C and 100 degrees C, both SBDs exhibited a similar change in conduction mechanism from thermionic field emission (TFE) to thermionic emission (TE) due to the activation of N-vacancies (V-N) (E-a = -1.67 0.02 eV). However, at high voltages when the temperature is 100 degrees C, the conduction mechanism changes from TE to TFE due to the de-trapping of electrons from activated carbon-traps (E-a = +0.69 eV) in the grown drift layers.
机译:测量高度补偿的15μm和30μmn型GaN漂移层的SBD的电流电压 - 温度特性(0摄氏度C至150摄氏度),分别测量高达-300V的电压和高达-800 v 。当温度在75摄氏度和100摄氏度之间时,由于N - 空位(VN)的激活(EA = - ),两个SBDS从热离子发射(TFE)到热离子发射(TE)的导通机构相似的导电机构相似的变化1.67 0.02 EV)。然而,当温度> 100摄氏度时的高电压下,由于在生长的漂移层中的激活碳疏水阀(E-A = +0.69eV)的电子的去捕获,导通机构从TE到TFE发生变化。

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  • 来源
    《Annales de l'I.H.P》 |2020年第7期|074001.1-074001.4|共4页
  • 作者单位

    Nanyang Technol Univ Sch Elect & Elect Engn Singapore 639798 Singapore;

    Nanyang Technol Univ Temasek Labs NTU Res Techno Plaza 50 Nanyang Dr Singapore 637553 Singapore|Nagoya Univ Ctr Integrated Res Future Elect CIRFE Inst Mat & Syst Sustainabil IMaSS Nagoya Aichi 4648603 Japan;

    Nanyang Technol Univ Sch Elect & Elect Engn Singapore 639798 Singapore|Nanyang Technol Univ Temasek Labs NTU Res Techno Plaza 50 Nanyang Dr Singapore 637553 Singapore;

    Nanyang Technol Univ Sch Elect & Elect Engn Singapore 639798 Singapore|Nanyang Technol Univ Temasek Labs NTU Res Techno Plaza 50 Nanyang Dr Singapore 637553 Singapore;

    Nagoya Univ Ctr Integrated Res Future Elect CIRFE Inst Mat & Syst Sustainabil IMaSS Nagoya Aichi 4648603 Japan;

    Nagoya Univ Ctr Integrated Res Future Elect CIRFE Inst Mat & Syst Sustainabil IMaSS Nagoya Aichi 4648603 Japan;

    Nagoya Univ Ctr Integrated Res Future Elect CIRFE Inst Mat & Syst Sustainabil IMaSS Nagoya Aichi 4648603 Japan;

    Nagoya Univ Ctr Integrated Res Future Elect CIRFE Inst Mat & Syst Sustainabil IMaSS Nagoya Aichi 4648603 Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    GaN-on-GaN; Vertical Schottky Barrier Diodes; Conduction Mechanism; Thermionic Emission; Activation Energy;

    机译:Gan-On-GaN;垂直肖特基屏障二极管;传导机制;热离子发射;活化能量;

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