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High-mobility two-dimensional electron gases at AlGaN/GaN heterostructures grown on GaN bulk wafers and GaN template substrates

机译:AlGaN / GaN异质结构在GaN散装晶片和GaN模板基板上生长的高迁移率二维电子气体

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We report a comparative study of the mobility of two-dimensional electron gases (2DEG) formed at AlGaN/GaN heterostructures by simultaneously growing on substrates with very different dislocation densities. The mobility is seen to depend on the 2DEG charge density directly, but surprisingly, dislocations do not cause a discernible impact on the mobility of the samples within the measured region 25 000;cm(2);V-?1;s(?1). This experimental observation questions the generally accepted belief that dislocations are one of the dominant low-temperature scattering mechanisms for low-density 2DEG at AlGaN/GaN structures.
机译:我们通过在具有非常不同的位错密度的基板上同时生长在AlGaN / GaN异质结构上形成的二维电子气(2deg)的迁移率的比较研究。迁移率可直接取决于2deg电荷密度,但令人惊讶的是,脱位不会对测量区域<25 000; cm(2); v-?1; s(? 1)。该实验观察结果普遍接受的信念,即位错是AlGaN / GaN结构的低密度2deg的主要低温散射机制之一。

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  • 来源
    《Annales de l'I.H.P》 |2019年第12期|121003.1-121003.4|共4页
  • 作者单位

    Cornell Univ Sch Elect & Comp Engn Ithaca NY 14853 USA;

    Cornell Univ Dept Mat Sci & Engn Ithaca NY 14853 USA;

    Cornell Univ Sch Elect & Comp Engn Ithaca NY 14853 USA|Cornell Univ Dept Mat Sci & Engn Ithaca NY 14853 USA|Cornell Univ Kavli Inst Nanoscale Sci Ithaca NY 14853 USA;

    Cornell Univ Sch Elect & Comp Engn Ithaca NY 14853 USA|Cornell Univ Dept Mat Sci & Engn Ithaca NY 14853 USA|Cornell Univ Kavli Inst Nanoscale Sci Ithaca NY 14853 USA;

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