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Analysis and improvement of mm-wave GaAs MESFET's.

机译:毫米波GaAs MESFET的分析和改进。

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摘要

A two-dimensional computer model, which takes into account the non-stationary conditions, is used to investigate several aspects of the GaAs submicron-gate MESFET.; First, this model is used to evaluate the effect of carrier injection into the MESFET buffer-layer. It is shown that the carrier injection reduces the transconductance and increases the output conductance. One of the ways to reduce the carrier injection is to introduce a potential-barrier between the active-layer and the substrate. Therefore, the MESFET grown on a P-substrate is studied. It is shown that a high acceptor concentration in the substrate depletes large part of the active-layer and greatly reduces the output current. A more flexible design can be obtained by introducing a thin P-layer between the active-layer and the semi-insulating substrate.; This model is also used in investigating the traveling Gunn domain phenomenon in GaAs MESFET's. It is shown that traveling domains exist in MESFET's with relatively thick active-layers. The propagation characteristics of these domains are studied in detail.; A new structure called Inverted-Gate FET (INGFET) is studied as well. This structure has equal input and output reactances. Hence, it relaxes the restriction on the device width which becomes very severe in the mm-wave range. Another structure that employs carrier injection over an N{dollar}sp+{dollar}-i junction and possesses equal input and output reactances is analyzed. It is called Inverted-Gate-Injection FET (INGIFET). The potential characteristics of the INGIFET are compared with those of the INGFET as well as the coplanar MESFET.
机译:考虑到非稳态条件的二维计算机模型用于研究GaAs亚微米栅极MESFET的几个方面。首先,该模型用于评估载流子注入MESFET缓冲层的效果。结果表明,载流子注入降低了跨导并增加了输出电导。减少载流子注入的方法之一是在有源层和衬底之间引入势垒。因此,研究了在P衬底上生长的MESFET。结果表明,衬底中高的受主浓度会耗尽有源层的大部分,并大大降低输出电流。通过在有源层和半绝缘衬底之间引入一个薄的P层,可以获得更加灵活的设计。该模型还用于调查GaAs MESFET中的行进Gunn域现象。结果表明,在具有相对较厚有源层的MESFET中存在传播域。对这些域的传播特性进行了详细研究。还研究了一种称为反相栅极FET(INGFET)的新结构。这种结构具有相等的输入和输出电抗。因此,放宽了对器件宽度的限制,该限制在毫米波范围内变得非常严格。分析了另一种在N {dollar} sp + {dollar} -i结上采用载流子注入并具有相等输入和输出电抗的结构。它被称为反相栅极注入FET(INGIFET)。将INGIFET的电位特性与INGFET以及共面MESFET的电位特性进行了比较。

著录项

  • 作者单位

    The University of Texas at Austin.;

  • 授予单位 The University of Texas at Austin.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1988
  • 页码 100 p.
  • 总页数 100
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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