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Modeling method for gallium-arsenic (GaAs) metal semiconductor field effect transistors (MESFETs)
Modeling method for gallium-arsenic (GaAs) metal semiconductor field effect transistors (MESFETs)
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机译:砷化镓(GaAs)金属半导体场效应晶体管(MESFET)的建模方法
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摘要
A modeling method for a gallium-arsenic metal semiconductor field effect transistor (GaAs MESFET) is disclosed. In order to show satisfactory current-voltage characteristics for the entire region of the drain voltage, the drain current is modeled as being proportional to the hyperbolic-tanh value of the drain voltage, and the small signal model using the drain current modeled as described above. Induce. The device capacitance is modeled by three conditions: pre-pinch-off, transient and post-pinch-off. The device charge amount is modeled using the condition that the charge amount when the gate voltage is 0 and the charge amount at the boundary point must be continuous. Models embedded in existing SPICEs can be easily modified, providing accurate simulators for GaAs MESFETs.
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