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Modeling method for gallium-arsenic (GaAs) metal semiconductor field effect transistors (MESFETs)

机译:砷化镓(GaAs)金属半导体场效应晶体管(MESFET)的建模方法

摘要

A modeling method for a gallium-arsenic metal semiconductor field effect transistor (GaAs MESFET) is disclosed. In order to show satisfactory current-voltage characteristics for the entire region of the drain voltage, the drain current is modeled as being proportional to the hyperbolic-tanh value of the drain voltage, and the small signal model using the drain current modeled as described above. Induce. The device capacitance is modeled by three conditions: pre-pinch-off, transient and post-pinch-off. The device charge amount is modeled using the condition that the charge amount when the gate voltage is 0 and the charge amount at the boundary point must be continuous. Models embedded in existing SPICEs can be easily modified, providing accurate simulators for GaAs MESFETs.
机译:公开了一种用于镓砷金属半导体场效应晶体管(GaAs MESFET)的建模方法。为了在整个漏极电压区域显示令人满意的电流-电压特性,将漏极电流建模为与漏极电压的双曲线tanh值成比例,并使用如上所述建模的漏极电流来建立小信号模型。诱导。器件电容通过以下三种条件建模:收缩前,瞬态和收缩后。使用栅极电压为0且边界点处的电荷量必须连续时的电荷量的条件对器件电荷量进行建模。嵌入在现有SPICE中的模型可以轻松修改,从而为GaAs MESFET提供准确的模拟器。

著录项

  • 公开/公告号KR19980084366A

    专利类型

  • 公开/公告日1998-12-05

    原文格式PDF

  • 申请/专利权人 배순훈;

    申请/专利号KR19970020137

  • 发明设计人 이찬희;

    申请日1997-05-23

  • 分类号H01L29/80;

  • 国家 KR

  • 入库时间 2022-08-22 02:18:51

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