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METAL SEMICONDUCTOR FIELD EFFECT TRANSISTORS (MESFETS) HAVING CHANNELS OF VARYING THICKNESSES AND RELATED METHODS
METAL SEMICONDUCTOR FIELD EFFECT TRANSISTORS (MESFETS) HAVING CHANNELS OF VARYING THICKNESSES AND RELATED METHODS
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机译:具有变化的厚度通道的金属半导体场效应晶体管(MESFET)及相关方法
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摘要
A unit cell of a metal-semiconductor field-effect transistor (MESFET) is provided. The unit cell includes a MESFET having a source (13), a drain (17) and a gate (24). The gate is between the source and the drain and on a channel layer (18) of the MESFET. The channel layer has a first thickness on a source side of the channel layer and a second thickness, thicker than the first thickness, on a drain side of the channel layer. Related methods of fabricating MESFETs are also provided herein.
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