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Pulsed laser deposition of europium-doped multilayer thin films for spectral storage applications.

机译:用于光谱存储应用的掺multilayer多层薄膜的脉冲激光沉积。

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摘要

This thesis studies different Eu optical centers in MgS:Eu and CaS:Eu thin films produced by Chemically Controlled Pulse Laser Deposition (CCPLD) and evaluates their suitability for the development of spectral storage devices of the future. The produced thin films consist of one or more optically active layer(s), MgS:Eu, CaS:Eu or a similar material, and a corresponding ZnS capping layer that functions as a protecting barrier for the other layers and preserves their composition and integrity. Given that the synthesis of the materials used to produce the multilayer structures in this work proved a great challenge, careful attention was given to the optimization of all fabrication parameters. Mass Spectrometry was used during the deposition of the thin films and the data obtained resulted on improvements and optimization of the deposition process. Scanning electron microscopy studies of these thin films were conducted to study degradation upon long-term storage. Microscopy results show that the morphology of the produced thin films is correlated to the growth environment during deposition and deterioration of the deposited materials could be initiated by nano-gaps and cracks in the capping layer of the thin films.;In addition to optical centers in MgS:Eu and CaS:Eu, new centers were created by changing the thin film growth environment inside a hi-vacuum chamber, modifying the composition of the ablation target material, or both. For example, introducing O2--, or alternatively HCl, inside the CCPLD chamber while producing MgS:Eu thin films results in the formation of impurity associated centers across lattice sites throughout the deposited structures. In another method of impurity doping studied, Cl-- and Na+ were introduced into the MgS:Eu and CaS:Eu lattices by mixing trace amounts of the impurity ions into these materials in polycrystalline form and making this mixture a deposition target by hi-pressure cold compression technique. The introduction of these impurity ions will alter the crystal field environment around the Eu ions thus creating new optical centers with a shift in energy of their characteristic Zero Phonon Line. After extensive characterization of the optical properties of the thin films produced, laser-induced fluorescence spectroscopy and absorption spectroscopy measurements confirm that they are suitable candidates to be used in conjunction with power-gated spectral holeburning technique and could potentially provide ultrahigh, terabits per square inch, storage densities.
机译:本文研究了通过化学控制脉冲激光沉积(CCPLD)生产的MgS:Eu和CaS:Eu薄膜中不同的Eu光学中心,并评估了它们在未来光谱存储设备发展中的适用性。产生的薄膜由一层或多层光学活性层,MgS:Eu,CaS:Eu或类似材料以及相应的ZnS覆盖层组成,该ZnS覆盖层充当其他层的保护层并保留其成分和完整性。鉴于这项工作中用于生产多层结构的材料的合成被证明是一个巨大的挑战,因此我们对所有制造参数的优化给予了认真的关注。在薄膜沉积过程中使用了质谱分析,所获得的数据有助于改善和优化沉积过程。对这些薄膜进行了扫描电子显微镜研究,以研究长期保存时的降解。显微镜结果表明,所产生的薄膜的形态与沉积过程中的生长环境有关,并且沉积的材料的劣化可能是由薄膜的覆盖层中的纳米间隙和裂纹引起的。 MgS:Eu和CaS:Eu,通过改变高真空腔室内的薄膜生长环境,修改烧蚀靶材料的成分或两者来创建新的中心。例如,在产生MgS:Eu薄膜的同时,在CCPLD腔室内引入O2--或HCl,会导致整个沉积结构的整个晶格部位形成杂质相关的中心。在研究的另一种杂质掺杂方法中,通过将痕量的杂质离子以多晶形式混合到这些材料中,并将Cl-和Na +引入MgS:Eu和CaS:Eu晶格中,并将该混合物作为高压沉积靶材,冷压缩技术。这些杂质离子的引入将改变Eu离子周围的晶体场环境,从而产生新的光学中心,其能量会发生其特征性零声子线的位移。在对生产的薄膜的光学特性进行全面表征后,激光诱导荧光光谱和吸收光谱测量结果证实它们是与功率门控光谱烧孔技术结合使用的合适候选物,并有可能提供每平方英寸超高兆兆倍,存储密度。

著录项

  • 作者

    Bezares, Francisco J.;

  • 作者单位

    Temple University.;

  • 授予单位 Temple University.;
  • 学科 Physics Condensed Matter.;Physics Optics.
  • 学位 Ph.D.
  • 年度 2010
  • 页码 163 p.
  • 总页数 163
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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