Pulsed laser deposition apparatus with separated target and deposition method for multilayer thin film using of the same

摘要

The present invention relates to a pulsed laser deposition apparatus, the substrate and the deposited material is located a chamber, located within the chamber, the deposition material, and by supporting the target and by irradiating the laser to the target portion to rotate decomposing the deposited material, a laser generator for depositing a thin film on the substrate from the deposited material decomposition includes, but not the target is the deposited material two or more, and having a physical block according to the deposition surface materials, and characterized in that the laser deposited material has been replaced, the irradiation with the rotation of the target, according to the present invention it can do so only by a simple operation precisely implement the ultra-thin multi-layer structure of a certain period, as well as how to apply them is very simple. ;