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High Throughput X-ray Diffractometer for Combinatorial Epitaxial Thin Films

机译:用于组合外延薄膜的高通量X射线衍射仪

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摘要

We report on the development of a high throughput x-ray diffractometer that concurrently measures spatially resolved x-ray diffraction (XRD) spectra of epitaxial thin films integrated on a substrate. A convergent x-ray is focused into a stripe on a substrate and the diffracted beam is detected with a two-dimensional x-ray detector, so that the snapshot image represents a mapping of XRD intensity with the axes of the diffraction angle and the position in the sample. High throughput characterization of crystalline structure is carried out for a Ba_xSr_(1-x)TiO_3 composition-spread film on a SrTiO_3 substrate. Not only the continuous spread of the composition (x), but also the continuous spread of the growth temperature (T) are given to the film by employing a special heating method. The boundary between the strained lattice and relaxed lattice is visualized by the concurrent XRD as functions of x and T in a high throughput fashion.
机译:我们报告了高通量x射线衍射仪的发展,该仪同时测量集成在基板上的外延薄膜的空间分辨x射线衍射(XRD)光谱。会聚的X射线聚焦到基板上的条带中,并使用二维X射线检测器检测衍射束,因此快照图像表示XRD强度与衍射角和位置的关系。在样本中。对SrTiO_3衬底上的Ba_xSr_(1-x)TiO_3成分扩散膜进行了晶体结构的高通量表征。通过采用特殊的加热方法,不仅使膜连续地散布(x),而且使膜的生长温度(T)连续散布。通过并发的XRD,可以以高通量方式将应变晶格和松弛晶格之间的边界可视为x和T的函数。

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