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GaN Single Crystalline Domain Growth on Graphene Substrate

机译:GaN单晶结构域生长石墨烯基材

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Graphene is very well known 2D nano-material which have novel physical and chemical properties even in a few layer thick form. Recently, there have been extensive studies on hetero-structures based on these Van-der-Waals 2D crystals like graphene, transition metal dichalcogenide (TMD), boron nitride (BN) and so on. In the case of graphene, this 2D layer can be stable and can be transferred to other target substrate with ease. Therefore, graphene can be a good candidate materials for growing other active materials on it. In this study, we tried to grow GaN micro-domain on graphene substrate using hydride vapor phase epitaxy (HVPE) method. GaN epitaxial behavior can be affected by the condition of graphene substrate and we compared the growth behavior of GaN micro-domain on graphene changing the preparation condition. And, several experimental parameters could be controlled like flow rate of Ga and N source with carrier gas, temperature and time to get the proper morphology of GaN micro-crystals. Despite of lattice mis-match of hexagonal GaN on graphene, we could grow single crystalline GaN micro-domain having the lateral size of a few or lager microns. We characterized these micro-crystalline GaN domains using optical microscopy, secondary electron microscope (SEM), micro-Raman spectroscopy and x-ray diffraction (XRD) which confirmed the crystalline phase of each domain. As a typical Van-der-Waals crystal, pristine non-defective graphene may have lacking dangling bonds leading to very low nucleation density for GaN growth and can be used even as a mask layer. When grown on the transferred graphene, however, we expect to have enough nucleation sites originating from the physical defects like grain boundary, vacancy and ripples of poly-crystalline graphene layer. This experimental finding is very interesting to further studies of graphene applications for hetero-structures of graphene and other complementary active materials because graphene has disadvantage in the applications of switching devices, optical elements and can be a potential candidate to overcome these weak points by utilizing very efficiently active GaN together.
机译:石墨烯是非常众所周知的2D纳米材料,即使以几层厚的形式也具有新的物理和化学性质。最近,基于石墨烯,过渡金属二甲基(TMD),氮化硼(BN)等的这些VAN-DER-WAALS 2D晶体,已经存在广泛的杂结构。在石墨烯的情况下,该2D层可以是稳定的并且可以轻松地转移到其他靶衬底。因此,石墨烯可以是用于在其上生长其他活性材料的良好候选材料。在这项研究中,我们试图使用氢化物​​气相外延(HVPE)方法在石墨烯基材上生长GaN微结构域。 GaN外延行为可能受到石墨烯底物条件的影响,并比较GaN微结构域对石墨烯的生长行为改变制备条件。并且,可以控制几种实验参数,如常规气体,温度和时间的Ga和N个源的流速,以获得GaN微晶的适当形态。尽管六角形GaN上的六角形GaN的晶格错误匹配,但我们可以长出单晶GaN微结构域,其具有横向尺寸或储存微米。我们使用光学显微镜,二次电子显微镜(SEM),微拉曼光谱和X射线衍射(XRD)表征了这些微晶GaN结构域,证实了每个结构域的结晶相。作为典型的vAN-DER-WALS晶体,原始的非缺陷石墨烯可能缺乏导致GaN生长的非常低的成核密度的悬空键,并且可以用作掩模层。然而,当在转移的石墨烯上生长时,我们期望具有足够的成核位点,源自晶界,空位和聚结晶石墨烯层的空位和涟漪等物理缺陷。该实验发现对于进一步研究石墨烯和其他互补有源材料的杂结构的石墨烯应用非常有趣,因为石墨烯在开关装置的应用中具有缺点,并且可以是通过利用非常克服这些弱点的潜在候选者。有效地活跃甘。

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