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首页> 外文期刊>Materials science in semiconductor processing >Seeded growth of GaN at high N_2 pressure on (0001) polar surfaces of GaN single crystalline substrates
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Seeded growth of GaN at high N_2 pressure on (0001) polar surfaces of GaN single crystalline substrates

机译:在高N_2压力下在GaN单晶衬底的(0001)极性表面上进行GaN的晶种生长

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摘要

GaN single crystals obtained by the high nitrogen pressure solution method without an intentional seeding, show strong growth anisotropy which results in their platelet shape. The attempts to enhance the growth into (0001) directions by the increase of the integral supercooling in the solution, often lead to the growth instabilities on both Ga-polar and N-polar (0001) surfaces. This can be avoided only by the precise control of the growth conditions at the crystallization front on the particular surface. The results of the seeded growth on both Ga- and N-polar (0001) surfaces in configuration enabling such a control is reported. It is shown that dominating mechanisms of the unstable growth such as the cellular growth or edge nucleation can be suppressed. Differences in nucleation and growth in dependence on surface polarity are discussed.
机译:通过高氮压溶液法获得的GaN单晶,无意晶种生长,显示出强烈的各向异性,从而形成了片状。通过增加溶液中整体过冷来增强向(0001)方向生长的尝试,通常会导致Ga极性和N极性(0001)表面的生长不稳定。这只能通过精确控制特定表面上结晶前沿的生长条件来避免。报道了在Ga-和N-极性(0001)表面上以能够进行这种控制的配置的种子生长结果。已经表明,可以抑制不稳定生长的主要机制,例如细胞生长或边缘成核。讨论了取决于表面极性的成核和生长差异。

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