A GaN single crystal is grown by synthesizing GaN in vapor phase, piling a GaN crystal on a substrate, producing a three-dimensional facet structure including facets in the GaN crystal without making a flat surface, maintaining the facet structure without burying the facet structure, and reducing dislocations in the growing GaN crystal. The facet structure reduces the EPD down to less than 106 cm-2. IMAGE
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机译:通过在气相中合成GaN,将GaN晶体堆积在基板上,在GaN晶体中产生包括刻面的三维刻面结构而不形成平坦表面,保持刻面结构而不埋入刻面结构的方式生长GaN单晶,并减少正在生长的GaN晶体中的位错。刻面结构将EPD降低到小于10 6 cm -2。 <图像>
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