首页> 外文会议>Symposium on Micromachining and Microfabrication >Analytical techniques for examining reliability and failure mechanisms of barrier coating encapsulated silicon pressure sensors exposed to harsh media
【24h】

Analytical techniques for examining reliability and failure mechanisms of barrier coating encapsulated silicon pressure sensors exposed to harsh media

机译:用于检查障碍涂层可靠性和故障机制的分析技术封装硅压传感器暴露于苛刻介质

获取原文

摘要

Low-cost, silicon piezoresistive pressure sensors need to be compatible with a variety of chemical environments to provide pressure and liquid level sensing products for various automotive, industrial, and consumer white goods applications. Previous work has identified that the typical failure mechanism for a barrier coated device involves the delamination of the coating from the substrate followed by corrosion of exposed metal areas. This work introduces the application of known electrochemical techniques for the development of accelerated experimental test procedures for sensor exposure to harsh environments. Qualitative correlation of these results with predicted reliability lifetimes, estimated statistically from media exposure testing, is shown. Several methods are presented for assessing the quality of barrier coatings. These techniques can be used both to identify specific corrosive failure mechanisms as they are occurring during media exposure, and to make relative predictions about the reliability lifetime of barrier coated and encapsulated devices. One demonstrated method is the simple measurement of open circuit (non-biased) potential. This is envisaged to show a mixed potential between all anodic and cathodic reactions, while taking into account the resistance of the coating. The fluctuations in mean potential with time depend on variations in the activities of different sensor regions and on underfilm passivation. The standard deviation of voltage noise can be used as an indication of the quality of the coatings. The critical factor in these measurements and sensor encapsulation in general is understanding reactant diffusion through a barrier coating. In addition, polarization measurements were used to examine the rate of media diffusion through the coating and to determine the reaction mechanism.
机译:低成本,硅压阻式压力传感器需要与各种化学环境兼容,为各种汽车,工业和消费者白色商品应用提供压力和液位传感产品。先前的工作已经确定了屏障涂覆装置的典型故障机理涉及从基板中涂覆涂层,然后腐蚀暴露的金属区域。本作品介绍了已知的电化学技术在加速实验试验程序开发中的传感器暴露于恶劣环境的应用。显示了这些结果与预测可靠性寿命的定性相关性,统计从媒体曝光测试估计。提出了几种方法,用于评估阻挡涂层的质量。这些技术可以使用,以识别在介质曝光期间发生的特定腐蚀性故障机制,并对屏障涂覆和封装装置的可靠性寿命进行相对预测。一个明示的方法是简单测量开路(非偏置)电位。设想这是为了在所有阳极和阴极反应之间显示混合潜力,同时考虑到涂层的电阻。平均潜力的波动随时间依赖于不同传感器区域的活动的变化以及inderfilm钝化。电压噪声的标准偏差可用作涂层质量的指示。这些测量和传感器封装的关键因素通常是通过阻挡涂层理解反应物扩散。此外,使用偏振测量来检查通过涂层的介质扩散速率并确定反应机制。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号