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Analysis and design considerations of static CMOS logics under process, voltage and temperature variation in UMC 0.18??m CMOS process

机译:UMC 0.18?m CMOS工艺中工艺,电压和温度变化下静态CMOS逻辑的分析和设计考虑

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In this paper, we analyze the circuit characteristic of static CMOS logics and provide the size ratio of PMOS to NMOS transistors under process, voltage and temperature (PVT) variations in UMC 0.18 μm CMOS process. The threshold voltage of a MOS transistor is influenced seriously under PVT variations with different channel length setting. The performances of the static CMOS logics are unstable in ultralow voltage. To find the best size ratio of PMOS to NMOS transistors, NOT gate are simulated with various channel length setting and PVT conditions. Five stages of NOT gate are designed by different ratios respectively to compose the ring oscillator. By examining oscillator output frequency, then we analyze the change of current according to various channel length and PVT conditions. By further analyzing the simulation results, if the channel length of MOS transistors is shorter than 300nm, or the supply voltage is lower than 0.9 V, then the performance of MOS transistors is unstable in UMC 0.18 μm CMOS process. Through the data and the simulation provided by this paper, we can design the circuits with different needs, and we can also understand how each different section of PVT variations and channel length setting will affect the circuit in UMC 0.18 μm CMOS process.
机译:在本文中,我们分析了静态CMOS逻辑的电路特性,并提供了在UMC 0.18μmCMOS工艺中工艺,电压和温度(PVT)变化情况下PMOS与NMOS晶体管的尺寸比。在具有不同沟道长度设置的PVT变化下,MOS晶体管的阈值电压会受到严重影响。静态CMOS逻辑的性能在超低电压下不稳定。为了找到PMOS与NMOS晶体管的最佳尺寸比,在各种沟道长度设置和PVT条件下模拟NOT门。分别按不同的比例设计五级非门组成环形振荡器。通过检查振荡器的输出频率,然后我们根据各种通道长度和PVT条件分析电流的变化。通过进一步分析仿真结果,如果MOS晶体管的沟道长度短于300nm,或者电源电压低于0.9 V,则MOS晶体管的性能在UMC 0.18μmCMOS工艺中不稳定。通过本文提供的数据和仿真,我们可以设计具有不同需求的电路,并且我们还可以了解PVT变化和通道长度设置的每个不同部分将如何影响UMC 0.18μmCMOS工艺中的电路。

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