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Novel radiation hardened latch design considering process, voltage and temperature variations for nanoscale CMOS technology

机译:考虑到工艺,电压和温度变化的新型防辐射闩锁设计,适用于纳米级CMOS技术

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摘要

As CMOS technology is scaled down, the supply voltage and gate capacitance are reduced, which results in the reduction of charge storing capacity at each node and increase of the susceptibility to external noise in radiation environments. The traditional error tolerant circuit design methods provide very limited protection against the environment noise for storage cells such as latches and memories. In this paper, a novel hardened latch design is proposed and compared with the previous hardened latch designs using 32 nm technology node. Extensive simulation results using HSPICE are reported to show that the proposed hardened latch design achieves 15x improvement of critical charge (Qcrit) with comparable cost in terms of speed and power compared to the most up to date hardened latch design. Moreover, PVT variations have great impact on the reliability of hardened circuit. The proposed latch circuit is also evaluated with the presence of PVT variations and demonstrates higher robustness than other considered robust latch under severe PVT variation condition.
机译:随着CMOS技术的按比例缩小,电源电压和栅极电容减小,这导致每个节点上的电荷存储容量减小,并增加了辐射环境中对外部噪声的敏感性。传统的容错电路设计方法为诸如锁存器和存储器之类的存储单元提供了非常有限的针对环境噪声的保护。本文提出了一种新颖的硬化锁存器设计,并将其与使用32 nm技术节点的先前硬化锁存器设计进行了比较。据报道,使用HSPICE进行的大量仿真结果表明,与最新的硬化锁存器设计相比,所建议的硬化锁存器设计在速度和功率方面的成本和可比性方面达到了15倍的临界电荷(Qcrit)改进。此外,PVT变化对硬化电路的可靠性有很大影响。所提出的锁存电路还通过PVT变化的存在进行了评估,并且在严重的PVT变化条件下,其鲁棒性高于其他考虑的鲁棒锁存器。

著录项

  • 来源
    《Microelectronics reliability》 |2011年第12期|p.2086-2092|共7页
  • 作者

    Haiqing Nan; Ken Choi;

  • 作者单位

    Electrical and Computer Engineering Department, Illinois Institute of Technology, Chicago, USA;

    Electrical and Computer Engineering Department, Illinois Institute of Technology, Chicago, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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